Granted Patent
Utility
US 5,081,001 · App. 07/543,324
Blocked monomer and polymers therefrom for use as photoresists
Inventors:
Christopher E. Osuch, Michael J. McFarland
Patented Case
View Patent ↗
Granted: Jan 14, 1992
Filed: Jun 25, 1990
Inventors
Christopher E. Osuch
Michael J. McFarland
Assignee (at issue)
Hoechst Celanese Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.