IP Library Granted Patent US 5,084,416
Granted Patent Utility
US 5,084,416 · App. 07/481,561

Method of forming a low resistance contact by forming a contact hole within a recess

Inventors: Hideto Ozaki, Shuichi Mayumi, Seiji Ueda
Patented Case View Patent ↗
Granted: Jan 28, 1992 Filed: Feb 20, 1990
Inventors
Hideto Ozaki
Shuichi Mayumi
Seiji Ueda
Assignee (at issue)
Matsushita Electronics Corporation

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Quick Facts
Patent No.
US 5,084,416
App. No.
07/481,561
Filed
1990-02-20
Granted
1992-01-28
Kind
A