Granted Patent
Utility
US 5,091,049 · App. 07/545,636
High density plasma deposition and etching apparatus
Inventors:
Gregor A. Campbell, Robert W. Conn, Tatsuo Shoji
Patented Case
View Patent ↗
Granted: Feb 25, 1992
Filed: Jun 29, 1990
Inventors
Gregor A. Campbell
Robert W. Conn
Tatsuo Shoji
Assignee (at issue)
Plasma & Materials Technologies, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.