Granted Patent
Utility
US 5,151,339 · App. 07/702,155
Photoresist composition containing diazoquinone photosensitizer and novalak resin characterized by the complete and selective removal of dimeric species from the novolak resin
Inventor:
Thomas R. Sarubbi
Patented Case
View Patent ↗
Granted: Sep 29, 1992
Filed: May 15, 1991
Inventor
Thomas R. Sarubbi
Assignee (at issue)
OCG Microelectronic Materials, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.