IP Library › Granted Patent US 5,200,529
Granted Patent Utility
US 5,200,529 · App. 07/782,699

Blocked monomer and polymers therefrom for use as photoresists

Inventors: Christopher E. Osuch, Michael J. McFarland
Patented Case View Patent ↗
Granted: Apr 6, 1993 Filed: Oct 25, 1991
Inventors
Christopher E. Osuch
Michael J. McFarland
Assignee (at issue)
Hoechst Celanese Corporation

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Quick Facts
Patent No.
US 5,200,529
App. No.
07/782,699
Filed
1991-10-25
Granted
1993-04-06
Kind
A