Granted Patent
Utility
US 5,208,124 · App. 07/671,567
Method of making a mask for proximity effect correction in projection lithography
Inventors:
Frederik Sporon-Fiedler, Nader Shamma, Edward Pei- Hong Lin
Patented Case
View Patent ↗
Granted: May 4, 1993
Filed: Mar 19, 1991
Inventors
Frederik Sporon-Fiedler
Nader Shamma
Edward Pei- Hong Lin
Assignee (at issue)
Hewlett-Packard Company, L.P.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.