Granted Patent
Utility
US 5,215,787 · App. 07/820,254
Method of forming silicon oxide film containing fluorine
Inventor:
Tetsuya Homma
Patented Case
View Patent ↗
Granted: Jun 1, 1993
Filed: Jan 14, 1992
Inventor
Tetsuya Homma
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.