IP Library › Granted Patent US 5,221,421
Granted Patent Utility
US 5,221,421 · App. 07/857,209

Controlled etching process for forming fine-geometry circuit lines on a substrate

Inventors: Jacques Leibovitz, Daniel J. Miller, Maria L. Cobarruviaz, John P. Scalia, Howard H. Nakano, Voddarahalli K. Nagesh, Clinton Chao
Patented Case View Patent ↗
Granted: Jun 22, 1993 Filed: Mar 25, 1992
Inventors
Jacques Leibovitz
Daniel J. Miller
Maria L. Cobarruviaz
John P. Scalia
Howard H. Nakano
Voddarahalli K. Nagesh
Clinton Chao
Assignee (at issue)
Hewlett-Packard Company, L.P.

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Quick Facts
Patent No.
US 5,221,421
App. No.
07/857,209
Filed
1992-03-25
Granted
1993-06-22
Kind
A