Granted Patent
Utility
US 5,230,740 · App. 07/809,288
Apparatus for controlling plasma size and position in plasma-activated chemical vapor deposition processes comprising rotating dielectric
Inventor:
John M. Pinneo
Patented Case
View Patent ↗
Granted: Jul 27, 1993
Filed: Dec 17, 1991
Inventor
John M. Pinneo
Assignee (at issue)
Crystallume Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.