Granted Patent
Utility
US 5,230,771 · App. 07/716,486
Plasma etching indium tin oxide using a deposited silicon nitride mask
Inventor:
Paul L. Roselle
Patented Case
View Patent ↗
Granted: Jul 27, 1993
Filed: Jun 17, 1991
Inventor
Paul L. Roselle
Assignee (at issue)
EASTMAN KODAK COMPANY
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.