Granted Patent
Utility
US 5,250,328 · App. 07/875,763
Process and apparatus for plasma CVD coating or plasma treating substrates
Inventor:
Jurgen Otto
Patented Case
View Patent ↗
Granted: Oct 5, 1993
Filed: Apr 29, 1992
Inventor
Jurgen Otto
Assignee (at issue)
Schott Glaswerke
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.