Granted Patent
Utility
US 5,256,521 · App. 08/011,572
Process of developing a positive pattern in an O-quinone diazide photoresist containing a tris-(hydroxyphenyl) lower alkane compound sensitivity enhancer
Inventor:
Tripunithura V. Jayaraman
Patented Case
View Patent ↗
Granted: Oct 26, 1993
Filed: Feb 1, 1993
Inventor
Tripunithura V. Jayaraman
Assignee (at issue)
OCG Microelectronic Materials, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.