IP Library Granted Patent US 5,266,510
Granted Patent Utility
US 5,266,510 · App. 07/566,433

High performance sub-micron p-channel transistor with germanium implant

Inventor: Ruojia Lee
Patented Case View Patent ↗
Granted: Nov 30, 1993 Filed: Aug 9, 1990
Inventor
Ruojia Lee
Assignee (at issue)
Micron Technology, Inc.

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Quick Facts
Patent No.
US 5,266,510
App. No.
07/566,433
Filed
1990-08-09
Granted
1993-11-30
Kind
A