Granted Patent
Utility
US 5,271,972 · App. 07/930,121
Method for depositing ozone/TEOS silicon oxide films of reduced surface sensitivity
Inventors:
Kurt Kwok, Robert Robertson
Patented Case
View Patent ↗
Granted: Dec 21, 1993
Filed: Aug 17, 1992
Inventors
Kurt Kwok
Robert Robertson
Assignee (at issue)
Applied Materials, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.