IP Library › Granted Patent US 5,281,302
Granted Patent Utility
US 5,281,302 · App. 08/004,528

Method for cleaning reaction chambers by plasma etching

Inventors: Zvonimir Gabric, Alexander Gschwandtner, Oswald Spindler
Patented Case View Patent ↗
Granted: Jan 25, 1994 Filed: Jan 14, 1993
Inventors
Zvonimir Gabric
Alexander Gschwandtner
Oswald Spindler
Assignee (at issue)
Siemens Aktiengesellschaft

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Quick Facts
Patent No.
US 5,281,302
App. No.
08/004,528
Filed
1993-01-14
Granted
1994-01-25
Kind
A