Granted Patent
Utility
US 5,288,518 · App. 07/894,584
Chemical vapor deposition method for forming fluorine containing silicon oxide film
Inventor:
Tetsuya Homma
Patented Case
View Patent ↗
Granted: Feb 22, 1994
Filed: Jun 5, 1992
Inventor
Tetsuya Homma
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.