Granted Patent
Utility
US 5,290,713 · App. 07/882,554
Process of manufacturing a semiconductor device by using a photoresist mask which does not encircle an area of implanted ions
Inventor:
Shigeharu Matsumoto
Patented Case
View Patent ↗
Granted: Mar 1, 1994
Filed: May 13, 1992
Inventor
Shigeharu Matsumoto
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.