IP Library › Granted Patent US 5,300,380
Granted Patent Utility
US 5,300,380 · App. 07/947,899

Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers

Inventors: Martin Roth, Kurt Meier
Patented Case View Patent ↗
Granted: Apr 5, 1994 Filed: Sep 17, 1992
Inventors
Martin Roth
Kurt Meier
Assignee (at issue)
Ciba-Geigy

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Quick Facts
Patent No.
US 5,300,380
App. No.
07/947,899
Filed
1992-09-17
Granted
1994-04-05
Kind
A