Granted Patent
Utility
US 5,314,724 · App. 07/923,882
Process for forming silicon oxide film
Inventors:
Atuhiro Tsukune, Yuji Furumura, Hatanaka Masanobu
Patented Case
View Patent ↗
Granted: May 24, 1994
Filed: Aug 27, 1992
Inventors
Atuhiro Tsukune
Yuji Furumura
Hatanaka Masanobu
Assignees (at issue)
Fujitsu Limited
Fujitsu VLSI Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.