IP Library › Granted Patent US 5,328,810
Granted Patent Utility
US 5,328,810 · App. 07/981,976

Method for reducing, by a factor or 2.sup.-N, the minimum masking pitch of a photolithographic process

Inventors: Tyler Lowrey, Randal W. Chance, David A. Cathey
Patented Case View Patent ↗
Granted: Jul 12, 1994 Filed: Nov 25, 1992
Inventors
Tyler Lowrey
Randal W. Chance
David A. Cathey
Assignee (at issue)
Micron Technology, Inc.

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Quick Facts
Patent No.
US 5,328,810
App. No.
07/981,976
Filed
1992-11-25
Granted
1994-07-12
Kind
A