IP Library › Granted Patent US 5,340,702
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US 5,340,702 · App. 07/923,894

Method of forming fine resist pattern

Inventors: Hiroyuki Hirasawa, Minako Kobayashi, Yasuo Matsuki
Patented Case View Patent ↗
Granted: Aug 23, 1994 Filed: Aug 27, 1992
Inventors
Hiroyuki Hirasawa
Minako Kobayashi
Yasuo Matsuki
Assignee (at issue)
Japan Synthetic Rubber Corporation

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Quick Facts
Patent No.
US 5,340,702
App. No.
07/923,894
Filed
1992-08-27
Granted
1994-08-23
Kind
A