Granted Patent
Utility
US 5,346,586 · App. 07/996,074
Method for selectively etching polysilicon to gate oxide using an insitu ozone photoresist strip
Inventor:
David J. Keller
Patented Case
View Patent ↗
Granted: Sep 13, 1994
Filed: Dec 23, 1992
Inventor
David J. Keller
Assignee (at issue)
Micron Semiconductor, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.