Granted Patent
Utility
US 5,346,799 · App. 07/986,223
Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde
Inventors:
Alfred T. Jeffries, III, David Brzozowy
Patented Case
View Patent ↗
Granted: Sep 13, 1994
Filed: Dec 7, 1992
Inventors
Alfred T. Jeffries, III
David Brzozowy
Assignee (at issue)
OCG Microelectronic Materials, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.