Granted Patent
Utility
US 5,354,446 · App. 07/936,281
Ceramic rotatable magnetron sputtering cathode target and process for its production
Inventors:
Otojiro Kida, Akira Mitsui, Atsushi Hayashi
Patented Case
View Patent ↗
Granted: Oct 11, 1994
Filed: Aug 28, 1992
Inventors
Otojiro Kida
Akira Mitsui
Atsushi Hayashi
Assignee (at issue)
ASAHI GLASS CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.