IP Library › Granted Patent US 5,356,828
Granted Patent Utility
US 5,356,828 · App. 08/086,598

Method of forming micro-trench isolation regions in the fabrication of semiconductor devices

Inventors: Stephen W. Swan, Ellen G. Piccioli
Patented Case View Patent ↗
Granted: Oct 18, 1994 Filed: Jul 1, 1993
Inventors
Stephen W. Swan
Ellen G. Piccioli
Assignee (at issue)
Digital Equipment Corporation

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Quick Facts
Patent No.
US 5,356,828
App. No.
08/086,598
Filed
1993-07-01
Granted
1994-10-18
Kind
A