Granted Patent
Utility
US 5,360,693 · App. 08/059,518
Positive o-quinone diazide photoresist containing base copolymer utilizing monomer having anhydride function and further monomer that increases etch resistance
Inventors:
Michael Sebald, Recai Sezi, Rainer Leuschner, Seigfried Birkle, Hellmut Ahhe
Patented Case
View Patent ↗
Granted: Nov 1, 1994
Filed: May 10, 1993
Inventors
Michael Sebald
Recai Sezi
Rainer Leuschner
Seigfried Birkle
Hellmut Ahhe
Assignee (at issue)
Siemens Aktiengesellschaft
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.