Granted Patent
Utility
US 5,371,039 · App. 08/019,359
Method for fabricating capacitor having polycrystalline silicon film
Inventor:
Shizuo Oguro
Patented Case
View Patent ↗
Granted: Dec 6, 1994
Filed: Feb 18, 1993
Inventor
Shizuo Oguro
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.