IP Library Granted Patent US 5,378,802
Granted Patent Utility
US 5,378,802 · App. 07/753,526

Method for removing impurities from resist components and novolak resins

Inventor: Kenji Honda
Patented Case View Patent ↗
Granted: Jan 3, 1995 Filed: Sep 3, 1991
Inventor
Kenji Honda
Assignee (at issue)
OCG Microelectronic Materials, Inc.

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Quick Facts
Patent No.
US 5,378,802
App. No.
07/753,526
Filed
1991-09-03
Granted
1995-01-03
Kind
A