Granted Patent
Utility
US 5,393,565 · App. 08/072,086
Method for deposition of a refractory metal nitride and method for formation of a conductive film containing a refractory metal nitride
Inventors:
Toshiya Suzuki, Takayuki Ohba, Shimpei Jinnouchi, Seishi Murakami
Patented Case
View Patent ↗
Granted: Feb 28, 1995
Filed: Jun 7, 1993
Inventors
Toshiya Suzuki
Takayuki Ohba
Shimpei Jinnouchi
Seishi Murakami
Assignee (at issue)
Fujitsu Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.