Granted Patent
Utility
US 5,395,801 · App. 08/130,117
Chemical-mechanical polishing processes of planarizing insulating layers
Inventors:
Trung T. Doan, Scott Meikle
Patented Case
View Patent ↗
Granted: Mar 7, 1995
Filed: Sep 29, 1993
Inventors
Trung T. Doan
Scott Meikle
Assignee (at issue)
Micron Semiconductor, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.