Granted Patent
Utility
US 5,431,964 · App. 08/111,894
Method of pretreating the deposition chamber and/or the substrate for the selective deposition of tungsten
Inventor:
Maurice Rivoire
Patented Case
View Patent ↗
Granted: Jul 11, 1995
Filed: Aug 26, 1993
Inventor
Maurice Rivoire
Assignee (at issue)
France Telecom (Etablissement Public National)
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.