IP Library › Granted Patent US 5,458,724
Granted Patent Utility
US 5,458,724 · App. 07/320,494

Etch chamber with gas dispersing membrane

Inventors: Daniel J. Syverson, Richard Novak, Eugene L. Haak
Patented Case View Patent ↗
Granted: Oct 17, 1995 Filed: Mar 8, 1989
Inventors
Daniel J. Syverson
Richard Novak
Eugene L. Haak
Assignee (at issue)
FSI INTERNATIONAL, INC.

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Quick Facts
Patent No.
US 5,458,724
App. No.
07/320,494
Filed
1989-03-08
Granted
1995-10-17
Kind
A