IP Library › Granted Patent US 5,467,883
Granted Patent Utility
US 5,467,883 · App. 08/150,261

Active neural network control of wafer attributes in a plasma etch process

Inventors: Robert C. Frye, Thomas Richard Harry, Earl R. Lory, Edward A. Rietman
Patented Case View Patent ↗
Granted: Nov 21, 1995 Filed: Nov 27, 1993
Inventors
Robert C. Frye
Thomas Richard Harry
Earl R. Lory
Edward A. Rietman
Assignee (at issue)
AT&T CORP.

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Quick Facts
Patent No.
US 5,467,883
App. No.
08/150,261
Filed
1993-11-27
Granted
1995-11-21
Kind
A