Granted Patent
Utility
US 5,478,399 · App. 08/161,720
Unitary wafer plasma enhanced chemical vapor deposition holding device
Inventor:
Calvin K. Willard
Patented Case
View Patent ↗
Granted: Dec 26, 1995
Filed: Dec 3, 1993
Inventor
Calvin K. Willard
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.