IP Library › Granted Patent US 5,482,819
Granted Patent Utility
US 5,482,819 · App. 08/223,255

Photolithographic process for reducing repeated defects

Inventors: Eddy Tjhia, Chi-Chan Lin, Anjali Anagol-Subbarao
Patented Case View Patent ↗
Granted: Jan 9, 1996 Filed: Apr 4, 1994
Inventors
Eddy Tjhia
Chi-Chan Lin
Anjali Anagol-Subbarao
Assignee (at issue)
NATIONAL SEMICONDUCTOR CORPORATION

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Quick Facts
Patent No.
US 5,482,819
App. No.
08/223,255
Filed
1994-04-04
Granted
1996-01-09
Kind
A