IP Library Granted Patent US 5,486,702
Granted Patent Utility
US 5,486,702 · App. 08/125,117

Scan technique to reduce transient wafer temperatures during ion implantation

Inventors: John P. O'Connor, John W. Smith
Patented Case View Patent ↗
Granted: Jan 23, 1996 Filed: Sep 21, 1993
Inventors
John P. O'Connor
John W. Smith
Assignee (at issue)
Genus, Inc.

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Quick Facts
Patent No.
US 5,486,702
App. No.
08/125,117
Filed
1993-09-21
Granted
1996-01-23
Kind
A