Granted Patent
Utility
US 5,494,784 · App. 08/357,400
Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
Inventors:
Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori, Yoshiyuki Harita
Patented Case
View Patent ↗
Granted: Feb 27, 1996
Filed: Dec 16, 1994
Inventors
Yoshihiro Hosaka
Ikuo Nozue
Masashige Takatori
Yoshiyuki Harita
Assignee (at issue)
Japan Synthetic Rubber Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.