Granted Patent
Utility
US 5,496,592 · App. 08/358,594
Method and apparatus for controlling ion implantation unit for early detection of ion implantation error
Inventor:
Yoshiyuki Saito
Patented Case
View Patent ↗
Granted: Mar 5, 1996
Filed: Dec 14, 1994
Inventor
Yoshiyuki Saito
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.