IP Library Granted Patent US 5,508,063
Granted Patent Utility
US 5,508,063 · App. 08/346,009

Tantalum compound, process of producing the same, and material for forming tantalum oxide films

Inventors: Toshiyuki Suzuki, Hideyuki Mori, Kouichi Nakamura
Patented Case View Patent ↗
Granted: Apr 16, 1996 Filed: Nov 29, 1994
Inventors
Toshiyuki Suzuki
Hideyuki Mori
Kouichi Nakamura
Assignee (at issue)
Japan Energy Corporation

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Quick Facts
Patent No.
US 5,508,063
App. No.
08/346,009
Filed
1994-11-29
Granted
1996-04-16
Kind
A