Granted Patent
Utility
US 5,509,970 · App. 08/308,302
Method of cleaning semiconductor substrate using an aqueous acid solution
Inventor:
Yoshimi Shiramizu
Patented Case
View Patent ↗
Granted: Apr 23, 1996
Filed: Sep 19, 1994
Inventor
Yoshimi Shiramizu
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.