Granted Patent
Utility
US 5,509,995 · App. 08/248,754
Process for anisotropically etching semiconductor material
Inventor:
Hae-Sang Park
Patented Case
View Patent ↗
Granted: Apr 23, 1996
Filed: May 25, 1994
Inventor
Hae-Sang Park
Assignee (at issue)
Hyundai Electronics Industries Co. Ltd.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.