Granted Patent
Utility
US 5,522,935 · App. 08/024,226
Plasma CVD apparatus for manufacturing a semiconductor device
Inventor:
Akira Sato
Patented Case
View Patent ↗
Granted: Jun 4, 1996
Filed: Mar 1, 1993
Inventor
Akira Sato
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.