Granted Patent
Utility
US 5,525,543 · App. 08/423,144
Method of making a semiconductor device using a titanium-rich silicide film
Inventor:
Shih-Chang Chen
Patented Case
View Patent ↗
Granted: Jun 11, 1996
Filed: Apr 17, 1995
Inventor
Shih-Chang Chen
Assignee (at issue)
OKI ELECTRIC INDUSTRY CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.