Granted Patent
Utility
US 5,528,047 · App. 08/490,353
Electron beam exposure apparatus with improved drawing precision
Inventor:
Ken Nakajima
Patented Case
View Patent ↗
Granted: Jun 18, 1996
Filed: Jun 14, 1995
Inventor
Ken Nakajima
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.