Granted Patent
Utility
US 5,543,347 · App. 08/363,941
Method of forming silicon film having jagged surface
Inventors:
Hideo Kawano, Keiji Shiotani, Masao Mikami, Tatsuya Suzuki, Seiichi Shishiguchi
Patented Case
View Patent ↗
Granted: Aug 6, 1996
Filed: Dec 27, 1994
Inventors
Hideo Kawano
Keiji Shiotani
Masao Mikami
Tatsuya Suzuki
Seiichi Shishiguchi
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.