Granted Patent
Utility
US 5,545,512 · App. 08/437,559
Method of forming a pattern of silylated planarizing photoresist
Inventor:
Tatsuo Nakato
Patented Case
View Patent ↗
Granted: Aug 13, 1996
Filed: May 9, 1995
Inventor
Tatsuo Nakato
Assignees (at issue)
Sharp Microelectronics Technology Inc.
SHARP KABUSHIKI KAISHA
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.