Granted Patent
Utility
US 5,554,465 · App. 08/448,100
Process for forming a pattern using a resist composition having a siloxane-bond structure
Inventor:
Hisashi Watanabe
Patented Case
View Patent ↗
Granted: Sep 10, 1996
Filed: May 23, 1995
Inventor
Hisashi Watanabe
Assignee (at issue)
Matsushita Electronics Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.