Granted Patent
Utility
US 5,558,978 · App. 08/358,131
Photoresist compositions containing copolymers having acid-labile groups and recurring units derived from either N-(hydroxymethyl)maleimide or N-(acetoxymethyl)maleimide or both
Inventors:
Ulrich Sch adeli, Norbert M unzel, Christoph De Leo, Heinz Holzwarth, Eric Tinguely
Patented Case
View Patent ↗
Granted: Sep 24, 1996
Filed: Dec 16, 1994
Inventors
Ulrich Sch adeli
Norbert M unzel
Christoph De Leo
Heinz Holzwarth
Eric Tinguely
Assignee (at issue)
OCG Microelectronic Materials, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.