Granted Patent
Utility
US 5,589,407 · App. 08/524,039
Method of treating silicon to obtain thin, buried insulating layer
Inventors:
Narayanan Meyyappan, Tatsuo Nakato
Patented Case
View Patent ↗
Granted: Dec 31, 1996
Filed: Sep 6, 1995
Inventors
Narayanan Meyyappan
Tatsuo Nakato
Assignee (at issue)
Implanted Material Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.