Granted Patent
Utility
US 5,604,059 · App. 08/290,603
Mask structure having phase shifting pattern suitable for forming fine pattern on photosensitive film and method of manufacturing solid-state devices using such mask structure
Inventors:
Ryo Imura, Yoshinori Hoshina, Kengo Asai, Mitsutaka Hikita, Atsushi Isobe, Ryo Suzuki, Kohji Oda, Kazuyuki Sakiyama
Patented Case
View Patent ↗
Granted: Feb 18, 1997
Filed: Aug 15, 1994
Inventors
Ryo Imura
Yoshinori Hoshina
Kengo Asai
Mitsutaka Hikita
Atsushi Isobe
Ryo Suzuki
Kohji Oda
Kazuyuki Sakiyama
Assignee (at issue)
HITACHI, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.